Shadow Lithography for Nanoscale Patterning

Organization:University of Washington, WA, US
I.P. Brief:Waferscale shadow lithography provides a method for forming nanoscale features as small as 1 nm on silicon wafers. It is free of the wavelength, physical contact and serial processing limitations of conventional lithographic techniques and can be used to create nanowells, nanochannels, nanowires or nanodots.
Keywords:nanoscale lithography, Moore\'s Law, nanowire, nanodots
Primary Industry:Electronics
Specific Market:Integrated circuit, biosensors, optical sensors

Full IP Descriptions available on-site.


Corporate Presentations:

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  • BASF
  • Eastman Kodak Company
  • Genzyme
  • Goodrich
  • Hewlett-Packard
  • Honda
  • Medtronic
  • Merck
  • Sanyo

Reserved Presentations:

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Platinum Sponsor

University of Hawaii

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Media Sponsors

(joint with Nanotech 2007) Nature
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Supporting Organizations

Boston University
Midwest Research University Network


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