Shadow Lithography for Nanoscale Patterning

Organization:University of Washington, WA, US
I.P. Brief:Waferscale shadow lithography provides a method for forming nanoscale features as small as 1 nm on silicon wafers. It is free of the wavelength, physical contact and serial processing limitations of conventional lithographic techniques and can be used to create nanowells, nanochannels, nanowires or nanodots.
Keywords:nanoscale lithography, Moore\'s Law, nanowire, nanodots
Primary Industry:Electronics
Specific Market:Integrated circuit, biosensors, optical sensors

Full IP Descriptions available on-site.

HIGHLIGHTS

Corporate Presentations:

  • Air Products
  • BASF
  • Eastman Kodak Company
  • Genzyme
  • Goodrich
  • Hewlett-Packard
  • Honda
  • Medtronic
  • Merck
  • Sanyo

Reserved Presentations:

  • ExxonMobil
  • IBM

Partnering Events:
(full access included)

Platinum Sponsor
University of Hawaii

Press Sponsor
Business Wire

Commercialization Partner
BusinessWeek

Sponsors
Invest Australia AzTE Technology Enterprises

Media Sponsors
(joint with Nanotech 2007) Nature
Science
Red Herring

Supporting Organizations
BirchBob
CONNECT
Boston University
Midwest Research University Network
OCTANe
AeA
LES-SVC

 

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