Shadow Lithography for Nanoscale Patterning
|Organization:||University of Washington, WA, US|
|I.P. Brief:||Waferscale shadow lithography provides a method for forming nanoscale features as small as 1 nm on silicon wafers. It is free of the wavelength, physical contact and serial processing limitations of conventional lithographic techniques and can be used to create nanowells, nanochannels, nanowires or nanodots.|
|Keywords:||nanoscale lithography, Moore\'s Law, nanowire, nanodots|
|Specific Market:||Integrated circuit, biosensors, optical sensors|
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