|Title:||Lithographic solutions for sub-32 nm semiconductor manufacturing|
|Executive Summary:||VIGMA Nanoelectronic is an early-stage company founded by Dr. Yijian Chen in July 2006 in the state of California. VIGMA Nanoelectronics provides cost-effective lithographic technologies for the semiconductor industry to sustain functional device scaling beyond 32 nm node. The company is developing spatial-frequency tripling/quadrupling technology, post-lithography misalignment correction technique for double patterning, and programmable MEMS micromirror array for EUV maskless lithography.
Frequency doubling/tripling and post-lithography misalignment correction technologies will be cost-effective methods enabling chip manufacturing for several generations beyond 32 nm with currently existing lithographic tools. Micromirror-based EUV maskless lithography is ideal for low-volume applications such as ASIC, manufacturing flexibility improvement, and reduction of design-to-market time.
|Venture is:||Seed Level|