M. Gharooni, M. Hosseini, R. Talei, M. Taghinejad, H. Taghinejad, S. Mohajerzadeh, M. Abdolahad
University of Tehran, Iran, Islamic Republic of
pp. 612 - 615
Keywords: nanosheets, nickel silicide, photoemission, morphology controlled
Morphologically controlled nanostructures have been increasingly important, because of their highly shape dependent physical and chemical properties. Nickel-silicide nanomaterials, due to their wide range of applications, attracted strong attentions. There are some reports on fabrication and characterization of one and two-dimensional nickel silicide nanostructures but realization of 3D one is still a challenge. Here we report, for the first time, realization of novel highly crystallographic 3D nickel silicide nanosheets (NSs) with unique morphology and ultra-thin thickness based on plasma processing of Ni layer on Si substrate and post deep reactive ion etching (DRIE). The nickel-silicide NSs are realized through the orientated diffusion of nickel atoms between neighboring (111) planes via a novel stress-induced oriented-diffusion method. These ultra-thin NSs show unique optical properties of photo luminescence (PL) that would be ascribed to the enhanced direct band gap. The preferential adsorption of nickel silicide atoms along the (111)-type plane could be responsible for the formation of ultrathin NSs. The PL spectrum exhibited the broad peaks with maximum intensity around wavelengths of 339, 367, 440, 520 and 534nm.