Advanced Manufacturing, Electronics and Microsystems: TechConnect Briefs 2015Advanced Manufacturing, Electronics and Microsystems TechConnect Briefs 2015

Sustainable Nanomanufacturing Chapter 2

DNA Double-Write Photolithography: A Synergy for Top-Down and Bottom-Up Nanofabrication

M.J. Heller, Y. Song
University of California San Diego, United States

pp. 101 - 104

Keywords: DNA, nanofabrication, photolithography, self-assembly, top-down, bottom-up

Intrinsic programmability and other unique properties of DNA allow it to be used as a self-assembly nanostructure material, easily functionalized with nanoparticles and other entities, and as a UV sensitive write material for patterning. Thus, DNA has shown considerable potential for both top-down photolithographic and bottom-up self-assembly nanofabrication. However, using present methods for UV patterning on DNA substrates limits the hybridization of complementary DNA sequences to only the DNA in the patterned areas that was not exposed to UV. Such UV single-write methods greatly restrict the full potential of DNA for further programmed self-assembly after patterning. We have now been able to demonstrate a DNA double-write process, which overcomes this limitation. Using specially designed DNA constructs immobilized on a glass substrate, UV patterning results in two distinct binding identities to which two different complementary DNA sequences can be hybridized. This provides a major advantage that allows DNA based self-assembly as well as further UV patterning to be carried out in both the UV exposed and non-exposed areas. Using the DNA double write process, UV patterning has been carried out with 500nm resolution.