A.A. Khosroabadi, P. Gangopadhyay, R.A. Norwood
university of Arizona, United States
pp. 147 - 149
Keywords: surface plasmon, nanostructures, metal Oxide, hybridization
Metal and metal oxide electrodes play a significant role in many cutting edge applications including photonics, membranes, biological supports, sensing, electrochromics, and in various green technologies, such as, photocatalytics, Li-ion batteries and photovoltaics. There is strong interest in the ability to create one-dimensional nanoscale metal and metal oxide electrode structures that provide high surface area, tunability of the electrode – organic interfaces, and low tortuosity for improved electron / hole transport characteristics. Interest in patterning polymer based nanodevices and creating sub-100 nm metal and transparent conducting oxide (TCO) based nanostructured electrodes (NSEs) has led us to modify the traditional imprint lithography technique to enable synthesis of an array of sub-30 nm diameter polymer nanostructures. In this approach, a hard e-beam lithographed Si or SiC master is used to directly imprint a large area nanopattern onto polyacrylonitrile (PAN) film. The PAN film is then cured at ~ 200 °C to synthesize nanostructures.The optical and electrical properties of these core shell electrodes including the surface plasmon frequency can be tuned by suitably changing the dielectrics and their dimensions. The surface plasmon wavelength of the nanopillar Ag changes from 650nm to 690nm depending on the dimensions of the pillars.