Advanced Manufacturing, Electronics and Microsystems: TechConnect Briefs 2015Advanced Manufacturing, Electronics and Microsystems TechConnect Briefs 2015

Nanoelectronics, Materials & Devices Chapter 6

TCAD AC analysis of Gate Electrode Workfunction Engineering Silicon Nanowire MOSFET for High Frequency Applications

N. Gupta, A. Kumar, R. Chaujar
Delhi Technological University, India

pp. 181 - 184

Keywords: gate engineering, silicon nanowire, power gains and RF

In this paper, we present the quantitative investigation of the high frequency performance of Gate Electrode Workfunction Engineered Si-Nanowire (GEWE-SiNW) MOSFET up to THz and compared with its conventional counterparts using device simulators: ATLAS and DEVEDIT 3D. Simulation results demonstrate the improved RF performance exhibited by GEWE-SiNW MOSFET over SiNW MOSFET and Conventional MOSFET in terms of power gains. Further, using three-dimensional (3-D) device simulations, we have examined the efficacy of gate length on RF figure of merit of GEWE-SiNW MOSFET. Moreover, simulation reveals significant enhancement in maximum available power gain (Gma) and maximum transducer power gain (GMT) have also been observed for GEWE-SiNW MOSFET due to alleviated short channel effects (SCEs) and improved drain current.Hence suitable for RF/wireless applications.