Advanced Materials: TechConnect Briefs 2015Advanced Materials TechConnect Briefs 2015

Nanotech Commercialization: Safety & Sustainability Chapter 11

Pulsed Laser Deposition: From the Laboratory to the Industry

A.S. Kuzanyan, A.A. Kuzanyan
Institute for Physical Research, Armenian Academy of Science, Armenia

pp. 628 - 631

Keywords: PLD, large area films, uniform, thickness, composition

Simple and inexpensive methods of obtaining large area uniform in thickness and composition thin films on large and very large substrates through pulsed laser deposition (PLD) have been proposed. Also a method of creating a laser spot of a certain configuration on the target is proposed, allowing almost full utilization of the target material. Three relatively simple methods of laser deposition of large area thin films are proposed. The first method employs controlled tilting of the target around the axis parallel with the substrate plane, with the respective positions of the laser beam, focal spot, and substrate being kept constant. The peculiarity of the second and third methods is laser deposition of the compound upon a substrate through a mask. The possibilities of different configurations of the slit in the mask are considered. Taking into account the significant benefits of laser deposition compared to other methods of obtaining thin films, industrial application of the proposed methods in developing new technologies for microelectronics and optical industries seems feasible.